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Kompa G Parameter Extraction Nonlinear Transistor Models 2020
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology. Table of Content Chapter 1 Lithography, Etch, and Silicon Process Technology Chapter 2 Optical Nanolithography Chapter 3 Multiple Patterning Lithography Chapter 4 EUV Lithography Chapter 5 Alignment and Overlay Chapter 6 Design for Manufacturing and Design Process Technology Co-Optimization Chapter 7 Chemistry of Photoresist Materials Chapter 8 Photoresist and Materials Processing Chapter 9 Optical Lithography Modeling Chapter 10 Maskless Lithography Chapter 11 Imprint Lithography Chapter 12 Metrology for Nanolithography Chapter 13 Directed Self-Assembly of Block Copolymers
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Kompa G. Parameter Extraction and Complex Nonlinear Transistor Models 2020.pdf
